martes, 12 de agosto de 2014
The BeMicron® coverall for cleanroom will be present at the 47th(2014 Spring) China National Pharmac
The BeMicron® coverall for cleanroom will be present at the 47th(2014 Spring) China National Pharmaceutical Machinery Exhibition in Wuhan, China from 24th to 27th in April.(www.cipm-expo.com). CIPM is one of the LARGEST pharmaceutical machinery industry show in the world.
Our representative in China, the company Rieckermann-China, will exhibit our BeMicron® solutions.
• The BeMicron® coverall for cleanroom improves the gowning process, reduce time and risk of operator error. It minimises the risk of contamination, all actions that could cause external contamination are avoided.
The BeMicron coverall is the solution when:
• Gowning procedures are strict and laborious,
• Risk of contamination is crucial for safety and for product yield
• Saving time and reducing cost are important
• Improvement in comfort for the operators is helpful.
BeMicron will also exhibit at P-MEC India in December.